By breaking the mold for e-beam lithography, Mapper introduces the unique benefits of e-beam direct-write to regular semiconductor manufacturing. For decades e-beam systems have been the laboratories’ beloved workhorses, due to their high resolution and for the flexibility that comes with not having to create costly masks. Today however, by their single-beam nature, these traditional systems can’t scale up to series production: it may take days to expose a fully covered 300 mm wafer at nodes below 90 nm. By deploying up to 650,000 parallel beamlets, it takes only minutes to do the same with Mapper technology. Even at 28 nm. Even at full density.